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dc.contributor.authorVasallo, Beatriz G.
dc.contributor.authorRodilla, Helena
dc.contributor.authorGonzález Sánchez, Tomás 
dc.contributor.authorMoschetti, Giuseppe
dc.contributor.authorGrahn, Jan
dc.contributor.authorMateos López, Javier 
dc.date.accessioned2013-09-03T07:34:50Z
dc.date.available2013-09-03T07:34:50Z
dc.date.issued2012
dc.identifier.citationSemiconductor Science and Technology 27, 065018 [1-5] (2012)es_ES
dc.identifier.urihttp://hdl.handle.net/10366/122101
dc.description.abstractKink effect can spoil the otherwise excellent low-noise performance of InAs/AlSb HEMTs. It has its origin in the pile up of holes (generated by impact ionization) taking place mainly at the drain side of the buffer, which leads to a reduction of the gate-induced channel depletion and results in a drain current enhancement. Our results indicate that the generation of holes by impact ionization and their further recombination lead to fluctuations in the charge of the hole pile up, which provoke an important increase of the drain-current noise, even when the kink effect is hardly perceptible in the output characteristics.es_ES
dc.description.sponsorshipROOTHz (FP7-243845)es_ES
dc.format.mimetypeapplication/pdf
dc.language.isoenges_ES
dc.rightsAttribution-NonCommercial-NoDerivs 3.0 Unported
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/3.0/
dc.subjectInAs HEMTses_ES
dc.subjectMonte Carlo methodes_ES
dc.subjectNoisees_ES
dc.subjectKink effectes_ES
dc.titleKink effect and noise performance in isolated-gate InAs/AlSb High Electron Mobility Transistorses_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.relation.publishversionhttps://doi.org/10.1088/0268-1242/27/6/065018
dc.subject.unesco22 Físicaes_ES
dc.identifier.doi10.1088/0268-1242/27/6/065018
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess


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