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dc.contributor.authorGonzález Sánchez, Tomás 
dc.contributor.authorOrfao, Beatriz
dc.contributor.authorPérez Santos, María Susana 
dc.contributor.authorMateos López, Javier 
dc.contributor.authorGarcía Vasallo, Beatriz 
dc.date.accessioned2025-09-30T08:31:22Z
dc.date.available2025-09-30T08:31:22Z
dc.date.issued2023
dc.identifier.citationGonzález, Tomás, et al. «Role of impact ionization and self-consistent tunnel injection in Schottky-barrier diodes operating under strong reverse-bias conditions». Applied Physics Express, vol. 16, n.o 2, febrero de 2023, p. 024003. DOI.org (Crossref), https://doi.org/10.35848/1882-0786/acb9d4.es_ES
dc.identifier.issn1882-0778
dc.identifier.urihttp://hdl.handle.net/10366/167231
dc.description.abstract[EN]This work shows that for a correct analysis of Schottky barrier diodes operating under strong reverse-bias conditions, it is necessary to account for the self-consistency between the shape of the energy barrier and carrier concentration in the depletion region since the full-depletion approximation fails to estimate the current. This happens for very high applied voltages, at which impact ionization by electrons and holes must also be considered. Two example GaN diodes with different doping concentrations and barrier heights are analyzed. The results are relevant to regions of the diodes where a very high tunnel injection takes place, like the contact edge or surface inhomogeneities.es_ES
dc.format.mimetypeapplication/pdf
dc.language.isoenges_ES
dc.publisherThe Japan Society of Applied Physicses_ES
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internacional*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.subjectSchottky-barrier diodees_ES
dc.subjectImpact ionizationes_ES
dc.subjectGaNes_ES
dc.subjectTunnel injectiones_ES
dc.titleRole of impact ionization and self-consistent tunnel injection in Schottky-barrier diodes operating under strong reverse-bias conditionses_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.relation.publishversionhttps://iopscience.iop.org/article/10.35848/1882-0786/acb9d4es_ES
dc.subject.unesco2203 Electrónicaes_ES
dc.identifier.doi10.35848/1882-0786/acb9d4
dc.relation.projectIDMCIN/AEI/10.13039/501100011033: PID2020–115842RB-I00es_ES
dc.relation.projectIDPhD contract from the Junta de Castilla y Leónes_ES
dc.rights.accessRightsinfo:eu-repo/semantics/openAccesses_ES
dc.identifier.essn1882-0786
dc.journal.titleApplied Physics Expresses_ES
dc.volume.number16es_ES
dc.issue.number2es_ES
dc.page.initial024003es_ES
dc.type.hasVersioninfo:eu-repo/semantics/draftes_ES


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Attribution-NonCommercial-NoDerivatives 4.0 Internacional
Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivatives 4.0 Internacional