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<dc:creator>Mateos López, Javier</dc:creator>
<dc:creator>Rodilla Sánchez-Cuadrado, Helena</dc:creator>
<dc:creator>García Vasallo, Beatriz</dc:creator>
<dc:creator>González Sánchez, Tomás</dc:creator>
<dc:date>2015</dc:date>
<dc:description>One of the main objectives of modern Microelectronics&#xd;
is the fabrication of devices with increased cutoff&#xd;
frequency and decreased level of noise. At this moment, the&#xd;
best devices for high-frequency, low-noise behavior areHigh&#xd;
electron mobility transistors (HEMTs) based on InGaAs and&#xd;
InAs channels. In this work, a complete analysis of ultrashort-&#xd;
gate HEMTs has been carried out by using a semiclassical&#xd;
Monte Carlo simulator, paying special attention to&#xd;
the noise performance. The validity of the model has been&#xd;
checked through the comparison of the simulated results with&#xd;
static, dynamic and noise measurements in real HEMTs. In&#xd;
order to reproduce the experimental results,we have included&#xd;
in the model some important real effects such as degeneracy,&#xd;
surface charges, presence of dielectrics and contact parasitics.&#xd;
The cryogenic performance of the HEMTs has also&#xd;
been analyzed. The influence of the parasitic resistances,&#xd;
width of the devices, value of the δ-doping and recess length&#xd;
has been analyzed when scaling down the gate length of the&#xd;
transistors to 50nm aiming at achieving higher cutoff frequencies&#xd;
and better noise performance. The important effect&#xd;
of the impact ionizationmechanisms and the consequent kink&#xd;
effect on the noise in both InGaAs and InAs based HEMTs&#xd;
have also been studied. Finally the advantages of the use of&#xd;
a double gate topology are quantified.</dc:description>
<dc:format>application/pdf</dc:format>
<dc:identifier>http://hdl.handle.net/10366/130647</dc:identifier>
<dc:language>eng</dc:language>
<dc:publisher>Springer</dc:publisher>
<dc:title>Monte Carlo modelling of noise in advanced III–V HEMTs</dc:title>
<dc:type>info:eu-repo/semantics/article</dc:type>
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