2024-03-29T14:08:17Zhttps://gredos.usal.es/oai/requestoai:gredos.usal.es:10366/1306512022-02-07T15:41:56Zcom_10366_4531com_10366_4512com_10366_3823col_10366_4532
Monte Carlo model for the analysis and development of III-V Tunnel-FETs and Impact Ionization-MOSFETs
Talbo, Vincent
Mateos López, Javier
González Sánchez, Tomás
Lechaux, Yoann
Wichmann, Nicolas
Bollaert, Sylvain
García Vasallo, Beatriz
Monte Carlo method
Tunnel FET
IMOS
Impact-ionization metal-oxide-semiconductor FETs (I-MOSFETs) are in competition with tunnel FETs (TFETs) in order to achieve the best behaviour for low power logic circuits. Concretely, III-V I-MOSFETs are being explored as promising devices due to the proper reliability, since the impact ionization events happen away from the gate oxide, and the high cutoff frequency, due to high electron mobility. To facilitate the design process from the physical point of view, a Monte Carlo (MC) model which includes both impact ionization and band-to-band tunnel is presented. Two ungated InGaAs and InAlAs/InGaAs 100 nm PIN diodes have been simulated. In both devices, the tunnel processes are more frequent than impact ionizations, so that they are found to be appropriate for TFET structures and not for I-MOSFETs. According to our simulations, other narrow bandgap candidates for the III-V heterostructure, such as InAs or GaSb, and/or PININ structures must be considered for a correct I-MOSFET design.
2016-10-04T08:00:00Z
2016-10-04T08:00:00Z
2015
info:eu-repo/semantics/article
V. Talbo, J. Mateos, T. González, Y. Lechaux, N. Wichmann, S. Bollaert and B. G. Vasallo; Monte Carlo model for the analysis and development of III-V Tunnel-FETs and Impact Ionization-MOSFETs; Journal of Physics: Conference Series 647, 012056 [1-4] (2015)
http://hdl.handle.net/10366/130651
10.1088/1742-6596/647/1/012056
eng
TEC2013-41640-R
SA052U13
ANR-13-JS03-0001-01
https://creativecommons.org/licenses/by-nc-nd/3.0/
info:eu-repo/semantics/openAccess
Attribution-NonCommercial-NoDerivs 3.0 Unported
Institute of Physics Publishing