TY  - JOUR 
AU  - Masciocchi, G.
AU  - Fattouhi, Mouad
AU  - Spetzler, E.
AU  - Syskaki, M.-A.
AU  - Lehndorf, R.
AU  - Martínez Vecino, Eduardo
AU  - McCord, J.
AU  - López Díaz, Luis
AU  - Kehlberger, A.
AU  - Kläui, Mathias
PY  - 2023
SN  - 0003-6951
UR  - http://hdl.handle.net/10366/153128
AB  - [EN]In this work, we propose and evaluate an inexpensive and CMOS-compatible method to locally apply strain on a Si/SiOx substrate. Due to high growth temperatures and different thermal expansion coefficients, a SiN passivation layer exerts a...
LA  - eng
KW  - Magnetism
KW  - Computational physics
TI  - Generation of imprinted strain gradients for spintronics
DO  - 10.1063/5.0157687
T2  - Applied Physics Letters
VL  - 123
ER  -