Mostra i principali dati dell'item

dc.contributor.authorGarcía-Sánchez, S
dc.contributor.authorPérez, S
dc.contributor.authorÍñiguez de la Torre Mulas, Ignacio 
dc.contributor.authorGarcía Vasallo, Beatriz 
dc.contributor.authorHuo, L
dc.contributor.authorLingaparthi, R
dc.contributor.authorNethaji, D
dc.contributor.authorRadhakrishnan, K
dc.contributor.authorAbou Daher, M
dc.contributor.authorLesecq, M
dc.contributor.authorGonzález Sánchez, Tomás 
dc.contributor.authorMateos López, Javier 
dc.date.accessioned2025-09-30T11:14:43Z
dc.date.available2025-09-30T11:14:43Z
dc.date.issued2024
dc.identifier.citationS García-Sánchez et al 2025 J. Phys. D: Appl. Phys. 58 015112es_ES
dc.identifier.issn0022-3727
dc.identifier.urihttp://hdl.handle.net/10366/167239
dc.description.abstract[EN]Impact ionization originated by the buffer leakage current, together with high electric fields (>3 MVcm−1) at the anode corner of the isolating trenches, has been identified as the failure mechanism of shaped planar GaN Gunn diodes when biased above 20 V, so that no evidence of Gunn oscillations in fabricated devices has been observed yet. In order to avoid the avalanche, we propose the addition of a Schottky substrate terminal, which, by means of Monte Carlo simulations, has been confirmed to be able to suppress such not-desired leakage current when applying a negative substrate bias. When the substrate bias is positive, impact ionization is also reduced due to the lower electric field at the hotspot, but a vertical cathode-substrate current degrades the device operation. In order to avoid such current, we propose the use a MIS configuration for the substrate contact, which is the optimal solution.es_ES
dc.format.mimetypeapplication/pdf
dc.language.isoenges_ES
dc.publisherIOPes_ES
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internacional*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.subjectDoped GaNes_ES
dc.subjectGunn diodeses_ES
dc.subjectMonte Carlo simulationses_ES
dc.subjectTHz generationes_ES
dc.titleAvoiding avalanche breakdown in planar GaN Gunn diodes by means of a substrate contactes_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.relation.publishversionhttps://iopscience.iop.org/article/10.1088/1361-6463/ad809fes_ES
dc.subject.unesco2203 Electrónicaes_ES
dc.identifier.doi10.1088/1361-6463/ad809f
dc.relation.projectIDMCIN/AEI/10.13039/501100011033: PID2020-115842RB-I00es_ES
dc.relation.projectIDMCIN/AEI/10.13039/501100011033: PDC2023-145896-I00es_ES
dc.relation.projectIDJunta de Castilla y León and FEDER: SA136P23es_ES
dc.relation.projectIDFundación General de la Universidad de Salamanca: PC_TCUE23-24_011es_ES
dc.rights.accessRightsinfo:eu-repo/semantics/openAccesses_ES
dc.identifier.essn1361-6463
dc.journal.titleJournal of Physics D: Applied Physicses_ES
dc.volume.number58es_ES
dc.issue.number1es_ES
dc.page.initial015112es_ES
dc.type.hasVersioninfo:eu-repo/semantics/draftes_ES


Files in questo item

Thumbnail

Questo item appare nelle seguenti collezioni

Mostra i principali dati dell'item

Attribution-NonCommercial-NoDerivatives 4.0 Internacional
Excepto si se señala otra cosa, la licencia del ítem se describe como Attribution-NonCommercial-NoDerivatives 4.0 Internacional