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Título
Avoiding avalanche breakdown in planar GaN Gunn diodes by means of a substrate contact
Autor(es)
Palabras clave
Doped GaN
Gunn diodes
Monte Carlo simulations
THz generation
Clasificación UNESCO
2203 Electrónica
Fecha de publicación
2024
Editor
IOP
Citación
S García-Sánchez et al 2025 J. Phys. D: Appl. Phys. 58 015112
Resumen
[EN]Impact ionization originated by the buffer leakage current, together with high electric fields
(>3 MVcm−1) at the anode corner of the isolating trenches, has been identified as the failure
mechanism of shaped planar GaN Gunn diodes when biased above 20 V, so that no evidence of
Gunn oscillations in fabricated devices has been observed yet. In order to avoid the avalanche,
we propose the addition of a Schottky substrate terminal, which, by means of Monte Carlo
simulations, has been confirmed to be able to suppress such not-desired leakage current when
applying a negative substrate bias. When the substrate bias is positive, impact ionization is also
reduced due to the lower electric field at the hotspot, but a vertical cathode-substrate current
degrades the device operation. In order to avoid such current, we propose the use a MIS
configuration for the substrate contact, which is the optimal solution.
URI
ISSN
0022-3727
DOI
10.1088/1361-6463/ad809f
Versión del editor
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